R-200 Advanced ALD System

PICOSUN™ R-series ALD tools’ unique hot-wall topflow dual-chamber design guarantees the deposition of highest quality ALD films with excellent uniformity even on the most challenging structures such as throughporous samples, ultra-high aspect ratio trenches or nanoparticulate powders. Our highly functional and easily exchangeable precursor sources for liquid, gaseous and solid chemicals enable particle-free processing of a wide range of materials on wafers, 3D objects and all nanoscale features. Plasma module, Gloves box and manual load-lock are also available.